Problem amtetcher SNF 2011-09-10 09:38:46: Process 2 uses NF3 bottle too- consequences

Yesterday my etch rate was low - around 245A/min. I wonder if this is caused by the excessive buildup of polymer in the chamber. NF3 is a necessary gas for process 2, the chamber cleaning recipe. Now that NF3 is low, process 2 is probably affected, therefore the efficiency of polymer removal.