I measured the (poly)-Si etch rate on program 3:
10 minute etch, only on tray #1, position#2, the
etch was about 670-690A, or about 70A/min.
this is, in my experience, about double of normal.
We usually see ~35A/min or less.
I'm leaving as "COMMENT" for now, as Nancy sorts
though the other Qual data.
(litho-nanospec measured poly on oxide)
Thursday, September 24, 2009
Subscribe to:
Post Comments (Atom)
No comments:
Post a Comment